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This software package was developed by Interface Ltd. and can be used in microelectronics and nanotechnology industries and research centers for designing and manufacturing modern micro- and nanoelectronic devices.

Purposes:

1. To convert any scanning electron microscope (SEM) into an e-beam lithograph.
2. To obtain ultimate resolution during lithography resolution for a certain setup. To this end:

• make correction for proximity effect during data preparation for lithography
• compensate for the distortion of scanning system during exposure and image acquisition

3. To predict results of lithography by simulating.
4. To ensure adjustment for various configurations of lithographic equipment; for the presence or absence of      beam blanking systems, stages, etc.
5. To create three-dimensional structures in a resist.
6. To familiarize user with the basic principles of lithography.

Picture 1. Scanning Electron Microscope controlled by the software

Description

The software package was developed to perform three basic functions:

1. Data preparation for exposure ( via Graphical Data Base).

• Manual design and transformation of data
• The proximity effect correction
• Modeling of exposure and resist development.
• Data import and export into various formats (GDSII, DXF, ELM….).
• Special transformation of data (Postprocessing, Group, Ungroup, Transformation, Modification, menu Edit) for selecting the structure elements boundaries (Frame), conversion of a positive image into a negative one (Negative), joining of elements (Union), etc.

2. Exposure control

• Variable exposure (dwell) times (for proximity correction).
• Synchronized movement of e-beam and stage.
• "on-the-fly" compensation of dynamic delays and distortion

3. Video control, system tuning

• Alignment of successive litographies via a set of marker windows.
• Digital microscope (a simple edotor for creating a system of marker windows)
• System for acquisition of grayscale of grayscale images.
• Procedures for the software adjustment to compensate the inaccuracies of a scanning system and a stage movement system.

Applications

• Microelectronics.
• Nanotechnology.
• 3D nano-micro structures (including biology).
• Diffractive optics (synthetic holograms) for visible and X-ray range
• Digital microscopy.

Easy installed on:

• SEM's (JEOL, PHILIPPS, ZEISS, LEICA…).
• Focused Ion Beam machines.
• STM/AFM's

System Requirements:

• Windows NT, 2000, XP

Picture 2
Alignment for successive e-beam and optical lithographies

Picture 3
Operation with superconductive nanodevice, IMT RAS (Russia)

Picture 4
Microdevice on 2DEG for magnetic measurements

Picture 5
Image generated by X-ray Phase hologram made by e-beam lithography, Bessy II (Germany), IMT RAS (Russia)

Picture 6
Kinoform optics by 3D lithography